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Chemical Vapor Deposition CVD System
Chemical Vapor Deposition CVD System
Description/ Specification of Chemical Vapor Deposition CVD System

CVD System consists of tube furnace,gas supply system and vacuum unit. Split vacuum tube furnace BTF-1200C BTF-1200c can supply vacuum&atmosphere protection environment . It is easy to installation and dispatch.From the transparent quartz chamber,the state of sintering can be observed. Pneumatic spring structure make the operator easy to open it. Tube size Φ50 ×1000mm(tube size can be optional) Heating element Fe-Cr-Alloy adopted by Mo Zone length Heating :440mm Constant:200mm Temperature controller *30 programmable segments for precise control of heating rate ,cooling rate and dwell time. *Built in PID automatic tune function with overheating&brocken thermocouple brocken protection and over temperature protection and alarm allows for operation without attendants. Accuracy ±1℃ Suggest heating rate 15℃/min Standard accessories quartz tube 1 pcs,stainless steel sealing flange 1set,silicon sealing ring 2set,high temperature glove1pair,quartz block1 pc. Gas-supply system 3 channels MFC,GMF-3Z Connector style Double cutting ferrule stainless steel connector Standard range(N2) 50sccm、100sccm、200sccm(optional) Accuracy ±1.5%FS Linearity ±0.5~1.5% Working pressure range 0.1~0.5 MPa Max.pressure 3MPa Connector Φ6,1/4'' Display LCD touch screen 3 figrues show Working tem. environment 5~45 High purity gas Pressure vacuum gauge -0.1~0.15 MPa(0.01 MPa/grid) Inter&exter Parabolic ss pipe Φ6 Low vacuum unit,Vau-02 Relative air humidity ≤85% Working voltage 220V±10% 50~60HZ Air bleed rate 8m³/h Experiment vacuum 1.0X10-1Pa Oil capacity 1.1L Inlet/Outlet caliber KF25 Rotation rate 1450rpm Noise 50dB

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